| 2023-12-1二手设备列表 | |||||||||
| ID | 设备名称 | 制造商 | 型号 | 年份 | 详细配置 | 状 态 | |||
| 2808 | Tel ACT8 Coater Developer涂胶显影机 | Tel | ACT8 | 2014-12-17 | 已打包 | 国外 | |||
| 2797 | KLA Surfscan SP2 | KLA | Surfscan SP2 | - | 300mm，真空处理与三重FI | 国外 | |||
| 2796 | TEL Trias (SFD TIN ) | TEL | Trias (SFD TIN ) | 2007 | 300mm As-Is, Wh | 国外 | |||
| 2795 | TEL Trias (SFD TIN ) | TEL | Trias (SFD TIN ) | 2007 | 300mm As-Is, Wh | 国外 | |||
| 2784 | TEL ACT-12涂胶显影机 | TEL | ACT-12 | 2004.4 | 300mm As-Is, Wh | 国外 | |||
| 2783 | TEL Trias | TEL | Trias | 2003.11 | 300mm As-Is, Wh | 国外 | |||
| 2782 | TEL UW300Z | TEL | UW300Z | 2002.3 | 300mm As-Is, Wh | 国外 | |||
| 2741 | TEL Mark-II 显影机 | TEL | Mark-II | 1989 | 6" 2D | 国外 | |||
| 2740 | TEL Mark-II 显影机 | TEL | Mark-II | 1989 | 6" 2D | 国外 | |||
| 2739 | TEL IW-6D 扩散炉 | TEL | IW-6D | 1996 | 5" 立式氧化 | 国外 | |||
| 2738 | TEL IW-6D 扩散炉 | TEL | IW-6D | 1997 | 5" 立式氧化 | 国外 | |||
| 2721 | TEL TE480HGC 干法刻蚀机 | TEL | TE480HGC | 1989 | 6" SIN刻蚀 | 国外 | |||
| 2720 | TEL TE480HGC 干法刻蚀机 | TEL | TE480HGC | 1989 | 6" SIN刻蚀 | 国外 | |||
| 2719 | TEL SAGAMI LIMITED VDF610S 扩散炉 | TEL SAGAMI LIMITED | VDF610S | 1989 | 6" 立式扩散 | 国外 | |||
| 2695 | TEL Lithius 涂胶显影机集成式 | TEL | Lithius | 2005.3 | 8"暂停销售 | 已售出 | |||
| 2683 | TEL Mark8 涂胶显影机 | TEL | Mark8 | 1997.3 | 8" 2C/1D | 国外 | |||
| 2623 | TEL Horizontal Furnace 扩散炉 | TEL | Horizontal Furnace | 1989 | 6" 四管卧式常压氧化 | 国外 | |||
| 2619 | TEL TE5000 干法刻蚀机 | TEL | TE5000 | - | 6" SIO2刻蚀机 | 国外 | |||
| 2607 | TEL INDYPLUS-B-M | TEL | INDYPLUS-B-M | 2013.06 | 300mm DIFF | 国外 | |||
| 2606 | TEL INDYPLUS- | TEL | INDYPLUS- | - | 300mm DIFF | 国外 | |||
| 2605 | TEL ALPHA-303I-H | TEL | ALPHA-303I-H | 2001.07 | 300mm DIFF | 国外 | |||
| 2604 | TEL ALPHA-303I-H | TEL | ALPHA-303I-H | 2006.11 | 300mm DIFF | 国外 | |||
| 2603 | TEL ALPHA-303I-K | TEL | ALPHA-303I-K | 2005.1 | 300mm DIFF | 国外 | |||
| 2602 | TEL ALPHA-303I-K | TEL | ALPHA-303I-K | 2005.11 | 300mm DIFF | 国外 | |||
| 2601 | TEL FORMUAL-1S-H | TEL | FORMUAL-1S-H | 2005.01 | 300mm DIFF | 国外 | |||
| 2521 | TEL TE8500刻蚀机6 | TEL | TE8500 | 6" | 国内 | ||||
| 2473 | 探针台 | - | TEL 19S | 6" | 国内 | ||||
| 2459 | TEL TE8500刻蚀机6 | TEL | TE8500 | 6" | 国内 | ||||
| 2412 | TEL Mark Vz 2C2D | TEL | Mark Vz 2C2D | - | As-is | 国外 | |||
| 2390 | TEL P-12XL Probe | TEL | P-12XL Probe | - | 12" As-is | 国外 | |||
| 2382 | TEL ACT12 Single Block | TEL | ACT12 Single Block | - | 12 As-is | 国外 | |||
| 2381 | TEL ACT8 2C4D, Double Block | TEL | ACT8 2C4D,Double Block | - | 8 working | 国外 | |||
| 2365 | TEL ALPHA 8S | TEL | ALPHA 8S | - | 8 As-is | 国外 | |||
| 2352 | TEL ACT12 | TEL | ACT12 | - | 12 Parts MC | 国外 | |||
| 2347 | TEL Mark 7 1C2D | TEL | Mark 7 1C2D | - | 6 As-is | 国外 | |||
| 2343 | TEL 8S-E POLC3 | TEL | 8S-E POLC3 | - | 6,8 working | 国外 | |||
| 2308 | TEL INDY Plus-B-M 12" | TEL | INDY Plus-B-M | 2010 | Furance | 国外 | |||
| 2307 | TEL TE8500刻蚀机6" | TEL | TE8500P | Dry Etch | 国外 | ||||
| 2301 | TEL Telius SP 12" | TEL | Telius SP | - | Dry Etch | 国外 | |||
| 2300 | TEL SCCM TE 12" | TEL | SCCM TE | - | Dry Etch | 国外 | |||
| 2293 | TEL TE-8401 8" | TEL | TE-8401 | 1996 | Dry Etcher | 国外 | |||
| 2287 | NIKON NSR-S204B(激光器是giga) | NIKON | NSR-S204B | - | Manufacturer : | 国外 | |||
| 2283 | AIXTRON AIX 2600 G3 HT MOCVD | AIXTRON | AIX 2600 G3 HT | 2006 | The owner of th | 国外 | |||
| 2281 | TEL Mark-7 Track | TEL | Mark-7 | - | 2C 3D生产线工作条件 | 国外 | |||
| 2280 | TEL Mark-8 Track | TEL | Mark-8 | - | 1C 2D原样仓库 | 国外 | |||
| 2269 | TEL TOKYO ELECTRON蚀刻去胶设备 | TEL | TELIUS SP-308 SCCM | 2007 | 按现状,有3台 | 国外 | |||
| 2267 | AIXTRON AIX 2600 G3 HT | AIXTRON | AIX 2600 G3 HT | 2006 | III-N Process |
国外 | |||
| 1994 | TEL MARK 8涂布机 | TEL | MARK 8涂布机 | - | - | 国外 | |||
| 1924 | TEL CLEAN TRACK MK-2涂胶显影 | TEL | MK-2 | - | - | 国内 | |||
| 1923 | TEL涂布机显影机 mark v | TEL | mark v | - | - | 国内 | |||
| 1898 | 显影机 | TEL | Mark-II | - | 6" | 国内 | |||
| 1897 | 显影机 | TEL | Mark-II | - | 6" | 国内 | |||
| 1896 | 扩散炉 | TEL | IW-6D | 1996 | 5" | 国内 | |||
| 1895 | 扩散炉 | TEL | IW-6D | 1997 | 5" | 国内 | |||
| 1877 | 干法刻蚀机 | TEL | TE480HGC | - | 6" | 国内 | |||
| 1876 | 干法刻蚀机 | TEL | TE480HGC | - | 6" | 国内 | |||
| 1875 | 扩散炉 | TEL SAGAMI LIMITED | VDF610S | - | 6" | 国内 | |||
| 1851 | 涂胶显影机 | TEL | Lithius | 2005.3 | 8" | 国内 | |||
| 1839 | Mark-8涂胶显影机 | TEL | Mark-8 | 1997.3 | 8" | 国内 | |||
| 1621 | COATER&DEVELOPER | TEL | ACT8(2C2D) | 1998 | PHOTOLITHO | 国外 | |||
| 1620 | DIFFUSION | TEL | Alpha-8SE | 2005 | DIFFUSION | 国外 | |||
| 1619 | FURNACE_LP-CVD | TEL | IW-6C | 1994 | FURNACE | 国外 | |||
| 1618 | CLEANING SYSTEM | TEL | MARK-7 | 1993 | WET | 国外 | |||
| 1617 | COATER | TEL | MARK-8 | 1999 | PHOTOLITHO | 国外 | |||
| 1616 | COATER&DEVELOPER | TEL | MARK-V | 1992 | PHOTOLITHO | 国外 | |||
| 1615 | COATER&DEVELOPER | TEL | MARK-Vz | 1998 | PHOTOLITHO | 国外 | |||
| 1614 | WAFER PROBER | TEL | P-12XL | 2002 | TEST | 国外 | |||
| 1613 | WAFER PROBER | TEL | P-12XL | 2002 | TEST | 国外 | |||
| 1612 | WAFER PROBER | TEL | P-12XLn | 2006 | TEST | 国外 | |||
| 1611 | WAFER PROBER | TEL | P-8XL | 2000 | TEST | 国外 | |||
| 1610 | WAFER PROBER | TEL | P-8XL | 2004 | TEST | 国外 | |||
| 1609 | WAFER PROBER | TEL | P-8XL | 2008 | TEST | 国外 | |||
| 1608 | WAFER SCRUBBER | TEL | SS-4 | 2001 | WET | 国外 | |||
| 1607 | WAFER SCRUBBER | TEL | SS-4 | 2003 | WET | 国外 | |||
| 1606 | PLASMA ETCHER | TEL | TACTRAS | 2013 | ETCH | 国外 | |||
| 1605 | OXIDE ETCHER | TEL | TE5000ATC | 1992 | ETCH | 国外 | |||
| 1604 | OXIDE ETCHER | TEL | TE8500(S) | 2000 | ETCH | 国外 | |||
| 1603 | OXIDE ETCHER | TEL | TE8500(S)ATC | 1992 | ETCH | 国外 | |||
| 1602 | OXIDE ETCHER | TEL | TE8500(S)ATC | 1993 | ETCH | 国外 | |||
| 1601 | OXIDE ETCHER | TEL | TE8500(S)ATC | 1995 | ETCH | 国外 | |||
| 1600 | OXIDE ETCHER | TEL | TE8500ATC | 1995 | ETCH | 国外 | |||
| 1599 | OXIDE ETCHER | TEL | Telius SCCM | 2000 | ETCH | 国外 | |||
| 1598 | OXIDE ETCHER | TEL | Unity Me 85D | 2003 | ETCH | 国外 | |||
| 1597 | OXIDE ETCHER | TEL | UnityII-855II | 1996 | ETCH | 国外 | |||
| 1596 | OXIDE ETCHER | TEL | UnityII-855II | 1996 | ETCH | 国外 | |||
| 1595 | OXIDE ETCHER | TEL | UnityIIe-655II | 2002 | ETCH | 国外 | |||
| 1594 | OXIDE ETCHER | TEL | UnityIIe-855II | 1997 | ETCH | 国外 | |||
| 1593 | OXIDE ETCHER | TEL | UnityIIe-855II | 2002 | ETCH | 国外 | |||
| 1592 | OXIDE ETCHER | TEL | UnityIIe-855SS | 2000 | ETCH | 国外 | |||
| 1591 | OXIDE ETCHER | TEL | UnityIIe-855SS | 2006 | ETCH | 国外 | |||
| 1495 | TEL P-12XL Probe | TEL | P-12XL Probe | - | 12" As-is | 国外 | |||
| 1494 | TEL Mark Vz 2C2D | TEL | Mark Vz 2C2D | - | As-is | 国外 | |||
| 1493 | TEL ACT8 2C4D, Double Block | TEL | ACT8 2C4D, Double Block | - | working | 国外 | |||
| 1492 | TEL Mark8 track (2c1d) | TEL | Mark8 track (2c1d) | - | working | 国外 | |||
| 1491 | TEL Mark 7 Single Block | TEL | Mark 7 Single Block | - | 200 As-is | 国外 | |||
| 1490 | TEL Mark 8 Single Block | TEL | Mark 8 Single Block | - | 200 As-is | 国外 | |||
| 1489 | TEL ACT12 Single Block | TEL | ACT12 Single Block | - | 300 As-is | 国外 | |||
| 1488 | TEL ACT8 Single Block | TEL | ACT8 Single Block | - | 200 As-is | 国外 | |||
| 1463 | Track | TEL | LITHIUS Pro-i | 2007 | 9COT 3DEV with | 国外 | |||
| 1462 | Track | TEL | LITHIUS | 2007 | 5C5D, Inlined t | 国外 | |||
| 1435 | CVD | TEL | Trias | 2004 | 4 x CVD TiN, 3 | 国外 | |||
| 1434 | CVD | TEL | Trias | 2011 | Trias E+, UV RF | 国外 | |||
| 1433 | CVD | TEL | Trias | 2006 | Ti Ch x2, TiN C | 国外 | |||
| 1432 | CVD | TEL | Trias | 2012 | 3CH | 国外 | |||
| 1431 | CVD | TEL | Trias | 2013 | EXII ALD TiN 1C | 国外 | |||
| 1430 | CVD | TEL | Trias SPA | 2010 | LM+TM+AC Rack, | 国外 | |||
| 1421 | Etch | TEL | TSP 305 SCCM TE | 2007 | 3x TE configure | 国外 | |||
| 1358 | Furnace | TEL | Alpha-303i | - | VMM-56-002, 2 b | 国外 | |||
| 1350 | Furnace | TEL | Alpha-303i | - | VMM-56-002, 2 b | 国外 | |||
| 1349 | Furnace | TEL | Alpha-303i | - | VMM-56-002, 2 b | 国外 | |||
| 1348 | Furnace | TEL | Alpha-303i | - | VMM-56-002, 2 b | 国外 | |||
| 1342 | Implant | TEL | nFusion 700 | 2013 | - | 国外 | |||
| 1328 | CVD | TEL | Trias | 2010 | - | 国外 | |||
| 1305 | TEL RLSA-H Chambers Etch | TEL | RLSA-H Chambers | 2011 | Dry Etch, Bx-, | 国外 | |||
| 1283 | Etch | TEL | Tactras Vigus-0 | 2010 | NCCP | 国外 | |||
| 1282 | Etch | TEL | Certas LEAGA | 2016 | In a line. SW V | 国外 | |||
| 1204 | Furnace | TEL | Indy Irad | 2007 | - | 国外 | |||
| 1177 | ATE | TEL | Precio octo | 2017 | - | 国外 | |||
| 1157 | CVD | TEL | Trias | 2006 | - | 国外 | |||
| 1156 | CVD | TEL | Trias | 2006 | - | 国外 | |||
| 1155 | CVD | TEL | Trias | 2006 | - | 国外 | |||
| 1151 | Track | TEL | LITHIUS i | 2005 | Missing parts | 国外 | |||
| 1126 | Others | TEL | Air Dryers | 2000 | - | 国外 | |||
| 1125 | Others | TEL | Air Dryers | 2001 | - | 国外 | |||
| 1124 | Component | TEL | D214 | 2001 | - | 国外 | |||
| 1118 | ATE | TEL | P-12XLn | 2005 | - | 国外 | |||
| 1117 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1112 | ATE | TEL | P-12XLn | 2005 | Missing parts i | 国外 | |||
| 1111 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1110 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1109 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1108 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1107 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1106 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1105 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1104 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1103 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1102 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1101 | ATE | TEL | P-12XLn+ | 2006 | Missing parts i | 国外 | |||
| 1074 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1073 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1072 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1062 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1061 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1060 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1059 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1058 | ATE | TEL | P-12XLn+ | 2005 | - | 国外 | |||
| 1057 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1056 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1055 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1054 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1053 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1052 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1051 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1050 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1049 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1048 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1047 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1046 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1045 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1044 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1043 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1042 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1041 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1040 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1039 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1038 | ATE | TEL | P-12XLn+ | 2008 | - | 国外 | |||
| 1037 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1036 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1035 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1034 | ATE | TEL | P-12XLn+ | 2006 | - | 国外 | |||
| 1033 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1032 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1031 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1030 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1029 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1028 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1027 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1026 | ATE | TEL | P-12XLn+ | 2007 | - | 国外 | |||
| 1010 | PVD | TEL | MBB-830 | 1995 | TiN 3CH(Cryo_CT | 国外 | |||
| 1009 | PVD | TEL | MBB-830 | 1995 | TiN 3CH(Cryo_CT | 国外 | |||
| 999 | Track | TEL | LITHIUS | 2006 | 2C5D, Inlined t | 国外 | |||
| 959 | Furnace | TEL | Alpha-303i-K | 2006 | 1. GFC : N2, N2 | 国外 | |||
| 958 | Furnace | TEL | Alpha-303i-K | 2003 | GFC (N2, SiH4, | 国外 | |||
| 957 | Furnace | TEL | Alpha-303i-K | 2003 | Process: D-Poly | 国外 | |||
| 956 | Furnace | TEL | Indy-B | 2012 | Indy-B-L, MFC(N | 国外 | |||
| 955 | Furnace | TEL | Alpha-303i-K | 2005 | GFC(N2, NH3, Si | 国外 | |||
| 954 | Furnace | TEL | Indy-A | 2005 | GAS (N2, NH3, S | 国外 | |||
| 953 | Furnace | TEL | Alpha-303i-K | 2004 | 1. GFC : N2, N2 | 国外 | |||
| 952 | Furnace | TEL | Alpha-303i-K | 2005 | GFC(SiH4,0.1%PH | 国外 | |||
| 934 | Track | TEL | ACT8 Dual | 2013 | 4C4D, Inline ty | 国外 | |||
| 932 | Track | TEL | LITHIUS | 2006 | 2C5D, Inlined t | 国外 | |||
| 931 | Track | TEL | LITHIUS | 2006 | 2C5D, Inlined t | 国外 | |||
| 930 | Track | TEL | LITHIUS | 2006 | 2C5D, Inlined t | 国外 | |||
| 929 | Track | TEL | LITHIUS | 2005 | 2C5D, Inlined t | 国外 | |||
| 928 | Track | TEL | LITHIUS | 2007 | 2C5D, Inlined t | 国外 | |||
| 927 | Track | TEL | LITHIUS | 2006 | 2C5D, Inlined t | 国外 | |||
| 926 | Track | TEL | LITHIUS | 2007 | 2C5D, Inlined t | 国外 | |||
| 925 | Track | TEL | LITHIUS | 2005 | 2C5D, Inlined t | 国外 | |||
| 924 | Track | TEL | LITHIUS | 2005 | 2C5D, Inlined t | 国外 | |||
| 920 | WET | TEL | Cellesta-i | 2012 | Single wet tool | 国外 | |||
| 855 | CVD | TEL | Trias Chamber | - | CVD Ti Ch( RF g | 国外 | |||
| 854 | CVD | TEL | Trias Chamber | - | CVD Ti Ch( RF g | 国外 | |||
| 853 | CVD | TEL | Trias Chamber | 2016 | CVD Ti Ch( RF g | 国外 | |||
| 852 | CVD | TEL | Trias Chamber | 2016 | CVD Ti Ch( RF g | 国外 | |||
| 851 | CVD | TEL | Trias Chamber | 2016 | CVD Ti Ch( RF g | 国外 | |||
| 849 | Furnace | TEL | Alpha-303i-K | 2004 | 1. GFC : N2, N2 | 国外 | |||
| 845 | CVD | TEL | Trias SPA | 2010 | LM+TM+AC Rack, | 国外 | |||
| 815 | Track | TEL | LITHIUS | 2005 | 2C5D, Inlined t | 国外 | |||
| 543 | Track | TEL | NS300 | 2005 | CSB (3Foup), AC | 国外 | |||
| 532 | Track | TEL | LITHIUS | 2007 | 2C5D, Inlined t | 国外 | |||
| 531 | Track | TEL | LITHIUS | 2006 | 5C5D, Inlined t | 国外 | |||
| 154 | MANIPULATOR | TEL | - | - | 1 SET | 国外 | |||
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龙玺精密-半导体工艺设备+国外二手设备 龙先生18868521984(微) |
| 注：设备状态不定期更新，是否已售出请咨询。 |