NV 10-160Maximum implant energy - 160 keV
Beam current range - 0.5 - 8mA
Wafer sizes - 3", 4", 5" 6" capable
End station - Manual load
Automatic wafer handling - No AT4
Source - Standard
Gas box - 4 ELB strings
Vacuum - Dry pump + diffusion pump
Control system - Standard console
Included Disks
• 4” 2-pt clamp (2)
• 6” Clampless (4)
• 4” Clampless (2)
• 6” Full Ring
• 4” Full Ring 0 deg.
•4” Full Ring (4)
•3” 2-pt
•3” Full Ring
Spare Part |
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