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设备完整不缺件,单腔,可以刻蚀SiO2和SiN,150mm已调试好

设备完整不缺件,有4台在美国;

设备完整不缺件,在韩国;

设备完整不缺件,韩国3台现货;

设备完整不缺件,只有一个工艺腔,在日本;

TE-8500P ATC

6"RIE SiO2 Etcher

TE-8500P ATC

6"RIE SiO2 Etcher

6"RIE SiO2 Etcher

TE-8500P ATC

6"RIE SiO2 Etcher

设备完整不缺件,已拆机在日本;

UnityIIe-855II

设备完整不缺件,在日本仓库;

设备完整不缺件,在线热机在日本(1C 3D WEE);

12"设备完整不缺件,有4台+2台chiller现货在台湾,不必打

设备完整不缺件,有现货23台;

设备完整不缺件,有现货17台;

设备完整不缺件,有现货5台(翻新的加1万美元);

设备完整不缺件,有现货6台;

UL-2604-08-HS

UL-2604-08-HS

4",5",6"CP测试,在线热机;

4",5",6",在线热机;

4",5",6"CP测试,在线热机(第六批);

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4,5,6,8"Marking Prober在线热机;

4",5",6",8"Marking Prober在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

4",5",6",8"CP测试,在线热机;

5"SIO2刻蚀,在线热机(第二批);

SIO2刻蚀,在线热机(第二批);

6"立式低压SIN CVD炉;

Horizontal Furnace

6"1C 1D 2MA 1AD 1COL 4HP WEE;

6"1C 1D 1WEE MA 1AD 5HP 2COL;

6"2D wEE 7HP 2COL MA CS;

6"2C 1AD MA 3HP 2CP;

6"2D 3CP 5HP MA Cs;

8",Turnkey加15万美元2C/1D;

UL-2604-08HS

UL-2604-08HS

UL-2604-08LS

UL-2604-08HS

TE-8500 PEATC

Trias (SFD TIN)

300mm As-Is, Where-Is

Trias (SFD TIN)

300mm As-Is, Where-Is

300mm As-Is, Where-Is;不含硬盘

300mm As-Is, Where-Is;不含硬盘

300mm As-Is, Where-Is;不含硬盘

UL-2604-08-HS

UL-2604-08-HS

Horizontal Furnace

6"立式低压SIN CVD炉;

INDYPLUS-B-M

ALPHA-303I-H

ALPHA-303I-H

ALPHA-303I-K

ALPHA-303I-K

FORMUAL-1S-H

P-12XL Probe

6 As-is 1C2D

INDY Plus-B-M

2C 3D生产线工作条件

UL-2604-08-HS

UL-2604-08-HS

UL-2604-08-HS

12"设备完整不缺件2C5D;

8"设备完整不缺件,有5台现货;

Unity Me 85D

UnityII-855II

UnityII-855II

UnityIIe-655II

UnityIIe-855II

UnityIIe-855II

UnityIIe-855SS

UnityIIe-855SS

P-12XL Probe

working track (2c1d)

200 As-is Single Block

LITHIUS Pro-i

9COT 3DEV with many CCHA bake and

5C5D, Inlined type(AT-850F), FOUP

4 x CVD TiN, 3 x load port FI ro

Trias E+, UV RF CH x3

Ti Ch x2, TiN Ch x2, Stage Heater

EXII ALD TiN 1CH System

LM+TM+AC Rack, Missing: PM

TSP 305 SCCM TE

3x TE configured

VMM-56-002, 2 boats, SiH4, PH3, C

VMM-56-002, 2 boats

VMM-56-002, 2 boats, SiH4, PH3, C

VMM-56-002, 2 boats, SiH4, PH3, C

RLSA-H Chambers

Dry Etch, Bx-, Cx-, E1 layers, 30

Tactras Vigus-0

Certas LEAGA

In a line. SW V1.90, Certas LEAGA

LITHIUS Pro-i

Missing parts

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

Missing parts in datasheet.

TiN 3CH(Cryo_CTI OB8)

TiN 3CH(Cryo_CTI OB8)

2C5D, Inlined type(5500iZa), FOUP

Alpha-303i-K

1. GFC : N2, N2O, SiH4 (MTO) 2. C

Alpha-303i-K

GFC (N2, SiH4, Si2H6, 0.1%PH3/N2,

Alpha-303i-K

Process: D-Poly, Gas: N2, 0.1%PH3

Indy-B-L, MFC(N2, NH3, SiH2Cl2, N

Alpha-303i-K

GFC(N2, NH3, SiH4, SiH2Cl2, N2O),

GAS (N2, NH3, SiH2Cl2, N2O), L/L

Alpha-303i-K

1. GFC : N2, N2O, SiH4 (MTO) 2. C

Alpha-303i-K

GFC(SiH4,0.1%PH3/N2,CiF3), L/L Ty

4C4D, Inline type, R->L, RDS Pump

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

2C5D, Inlined type(5500iZa), FOUP

Single wet tool, 12 chambers Proc

Trias Chamber

CVD Ti Ch( RF generator_ Kyosan 1

Trias Chamber

CVD Ti Ch( RF generator_ Kyosan 1

Trias Chamber

CVD Ti Ch( RF generator_ Kyosan 1

Trias Chamber

CVD Ti Ch( RF generator_ Kyosan 1

Trias Chamber

CVD Ti Ch( RF generator_ Kyosan 1

Alpha-303i-K

1. GFC : N2, N2O, SiH4 (MTO) 2. C

LM+TM+AC Rack, Missing: PM

2C5D, Inlined type(5500iZa), FOUP

CSB (3Foup), ACT #3 Controller /

2C5D, Inlined type(5500iZa), FOUP

5C5D, Inlined type(AT-850F), FOUP

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二手半导体设备交易平台semi1688.com